Basic Concepts of Sputtering Targets
Introduction and Background Information of Sputtering Targets In the vast field of material science, sputtering targets play a crucial role. Sputtering targets, often referred to as thin-film deposition targets, are the core materials used in thin-film production. They have profound significance in the history of material science, especially with the rise of the semiconductor and microelectronics industries. Advances in thin-film production techniques, such as magnetron sputtering and electron beam evaporation, have heavily relied on the development and use of high-quality sputtering targets. Types and Characteristics of Sputtering Targets Metal Targets: Metal targets are the most common type, including materials like copper, aluminum, gold, and silver. These targets are known for their high electrical conductivity and excellent thermal properties. In thin-film production, metal targets are typically used to create conductive films, such as pathways in electronic devices.
